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model:PT-1700

PECVD system for graphene growth

Application

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Detailed Parameters Of The Product

Description：
PECVD system Graphene Growth Furnace is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for vacuum sintering,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field.

Outstanding features of Graphene Growth Furnace :
1.Enclosed tube furnace
2.To be input inert gas, hydrocarbon gas,hydrogen.
3.Max. Temperature 1700C

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

Technical parameters of Graphene Growth Furnace :

Model	PT-1700CVD
Control system	Intelligent temperature control system
Display mode	Touch screen
Limiting temperature	1700℃
Working temperature	≤1650℃
Heating rate	≤20℃(suggestion:10℃/min)
Temperature control	±1℃
Heating element	MoSi2
Heating zone	Single
Heating zone length	300mm
Furnace tube material	High purity alundum tube
furnace tube diameter	80mm
The furnace tube length	1000mm
Gas tightness	Vacuum flange and corundum furnace tube up to 4.03×10-3Pa
Control mode	PID Temperature control
Thermal Couple	B Type
Power supply	110-480V 50Hz-60Hz
Total power	3KW
The flow meter	Mass Flow meters
Pneumatic pressure	-0.1～0.15 MPa
Warranty	12 month (exclusive wearing part)