0-2000°C RESEARCH MATERIAL & HEATING TREATMENT'S LEADER
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Description：
PECVD furnace for producing large area graphene films,is widely used product high quality sio2 film,si3N4 film,diamond film,hard thin film,optical thin film and CNT etc.
Descriptions of PECVD furnace:
PCVED by microwave or radio frequency make gas ionization containing film the
constituent atoms,in a local plasma formation,and plasma chemical activity is very strong,is easy to react,sedimentary out the desired film on substrate,it widely used product high quality sio2 film,si3N4 film,diamond film,hard thin film,optical thin film and CNT etc.
Outstanding features of PECVD furnace :
1. Lower temperature processing compared to conventional CVD.
2. Film stress can be controlled by high/low frequency mixing techniques.
3. Control over stoichiometry via process conditions.
4. Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy andAmorphous silicon (a-Si:H) deposition.
Technical parameters of PECVD furnace :
| Model | PT-1200-4-80(440) PECVD | |
| Tube Furnace | Display | LED |
| Max. Temperature | 1200℃ | |
| Continuous Woking Temp. | ≤1100℃ | |
| Heating Rate | 0~10℃/min | |
| Temperature Zone | Single | |
| Accuracy | ±1℃ | |
| Tube Size | 80*440mm(OD*heating zone) | |
| Temperature Control | PID automatic control via SCR power control | |
| Heating curves | 30 steps programmable | |
| Power | 220V,50 Hz Single phase, | |
|
Plasma RF Power supply |
Output Power | 5 -300W adjustable with ± 1% stability |
| RF frequency | 13.56 MHz ±0.005% stability | |
| Reflection Power | 200W max. | |
| Matching | Automatic | |
| RF Output Port | 50 Ω, N-type, female | |
| Noise | <50 dB. | |
| Cooling | Air cooling. | |
| Power | 220V, 50Hz | |
| Vacuum Pump |
KFD25 adapter and stainless steel pipe are connected between pump tube flange with precision ball valve Digital vacuum pressure gauge and display are installed with the furnace |
|
| Mass Flow meters |
Four precision mass flow meters : MFC 1: O2 flow range from 0~500 sccm MFC 2: H2 flow range from 0~500 sccm MFC 3: N2 flow range from 0~500 sccm MFC 4: Ar flow range from 0~500 sccm One gas mixing tank is installed on bottom case with liquid release valve 4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually Gas inlet fitting: four 1/4NPS Gas outlet fitting: four 1/4NPS |
|
PECVD furnace can be customized according to customers’requirements.
We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!
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No. 104, building 31, Xingyang equipment manufacturing industrial park, Zhengzhou City, Henan Province, China
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