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model:PT-OTF-1200

Graphene cvd tube furnace

Application

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Detailed Parameters Of The Product

Product Overview:
PT-OTF-1200-80*300-F3 is an idea system for graphene growth, it consists of one split tube furnace with 80mm diameter and 300mm long hot zone, one quartz tube or alumina tube is available. Its tube chamber could reach a high vacuum degree of 6.7*10-3Pa under cold state, it is also good choice for vacuum sintering. The gas-rout is specialy designed for N2 gas, H2 gas and CH4 gas. User can also choose other gases according to actual processing technology.

Technical parameter:

Display	Touch screen
Chamber	Split type
Max. Temperature	1200℃ for short time
Continuous Working Temp.	≤1100℃
Heating Rate	Suggestion: 0~15℃/min (max. 20℃/min)
Temperature Zone	300mm
Constant Heating Zone	150mm
Heating Element	Resistance Wire with Mo
Thermocouple	K type
Temperature Control Accuracy	±1℃
Tube Size	80 x 800mm (OD x L)
	Material: Alumina
Temperature Control	PID automatic control via SCR power control
Heating curves	32 steps programmable
Vacuum gauge	Composite vacuum gage
Vacuum Flange	Stainless Steel vacuum flange with valves and needles
Power source	220V, 50 Hz, single phase at max.3KW
Vacuum Pump Group Include KF25, KF50 Adpater,bellow for vacuum pump group and mobile cabinet with wheels.	Ultimate vacuum 6.67*10-3Pa under cold state.
Flow scope	(20, 30, 50, 100, 200, 300, 500) SCCM
Accuracy	±1.5 % F.S.
Repeat accuracy	±1.5 % F.S.
Response time	≦10sec
Working pressure difference range	0.1~0.5MPa
Pressure resistance	3MPa
Temperature Coefficient	Zero: ≤±0.2% F.S./℃; Span: ≤±0.2% F.S./℃
Working environment temperature	5~45℃
Input signal	0 V ~ +5.00 V
Output signal	0 V ~ +5.00 V
Electric plug form	DB15 pin（Female）
Power	+15 V 50 mA -15V 200 mA