Multi-position Tube Furnace

Application: This PT-T1200-X tube furnace is mainly used for Nanotube study, CVD research, sintering, coating, soldering, annealing, melting, analyzing of metal and non-metal materials in both vacuum condition and atmosphere condition in laboratories and enterprises, it can be equipped with vacuum pump system and gas-mixing system.

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Heat treatment equipment
Coating Equipment
- CVD System
- PECVD System
- Roll-to-roll graphene film growth equipment
- Plasma Magnetron Sputtering
- Evaporation Coating
Dental Furnace
Solution for Ultra Hard Tools
- Equipment for Ultra Hard Tools
- PCD and PCBN for Ultra Hard Tools
Other Lab Equipment
- Pressing Machine
- Sample Preparation
- Battery Equipment
- Plasma Cleaner
- Induction Furnace
- Dry Oven
- Microwave Equipment
- Reactor
- Glove Box

Model	PT-T1200-30X	PT-T1200-40X	PT-T1200-50X	PT-T1200-60X
Top Temperature	1200℃
Working Temperature	1100℃
Quartz Tube Diameter	Φ30	Φ40	Φ50	Φ60
Heating zone length	200/300mm
Insulation layers	High-Purity Alumina Ceramic fiber
Power Supply	110/220V 50/60HZ
Heating Rate	0-20℃/min
Control Accuracy	±1℃
Temperature Sensor	K-type Thermocouple
Heating Element	0Cr27Al7Mo2 Resistance Wire
Sealing	Flanges
Structure	Non-Split
Tilting Angle	0-180
Accessories	Gloves, Crucibles, Tongs, Crucible hook.
Optional	Vacuum pumps, Gas-mixing system with mass flowmeters or float flowmeters.
Customization is available.

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Multi-position Tube Furnace

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