PRODUCT

0-2000°C RESEARCH MATERIAL & HEATING TREATMENT'S LEADER

Ask for a free consultation Ask for technical support

Home > Products > Coating Equipment > PECVD System

model:PT-T1200

PT-T1200 PECVD Tube Furnace System

Application

Contact us for customize send-email: info@lab-furnace.com

Detailed Parameters Of The Product

Brief Introduction:
PT-T1200 PECVD is a is PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system which consists of 500W RF power supply, splitable tube furnace with 200mm diameter quartz tube, vacuum pump and three channels mass flow meters gas flowing system. It can mix 1-3 types of gases for CVD or diffusion.

Technical Parameter:

Part I: Standard Parts
Output Power	5 -500W adjustable with ± 1% stability
RF frequency	13.56 MHz ±0.005% stability
Reflection Power	200W max.
Matching	Automatic
RF Output Port	50 Ω, N-type, female
Noise	<50 dB.
Cooling	Air cooling.
Display	LED
Chamber	Split type and upper part can be opened
Continuous Woking Temp.	≤1100℃
Heating Rate	Suggestion: 0~10℃/min (max. 20℃/min)
Temperature Zone	500mm
Heating Element	Resistance wire with Mo
Thermocouple	K type
Temperature Control Accuracy	±1℃
Tube Size	200mm OD X Length 1600 mm
Tube Size	Material: Quarz Tube
Temperature Control	PID automatic control via SCR power control
Heating curves	30 steps programmable
Vacuum Flange	Stainless Steel vacuum flange with valve
Power	380V, 50 Hz, three phases at max.20KW
Rotary Vane Vacuum Pump Flow rate: 4L/S The rotary vane vacuum pump will be designed into a cart with wheel.
Three precision mass flow meters : MFC 1: Gas flow range from 0~100 sccm MFC 2: Gas flow range from 0~100 sccm MFC 3: Gas flow range from 0~100 sccm (or according to your requirement) One gas mixing tank is installed on bottom case with 3 stainless steel needle valves is installed on left side of bottom case to control 3 type gases mixing manually
Pirani digital vacuum gauge