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model:1200C CVD furnace

CVD chemical vapor deposition furnace with two gas channels

Application

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Detailed Parameters Of The Product

Description：
cvd chemical vapor deposition is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for CNT and graphene synthesis, CVD grown graphene,battery materials preparation and other research field.

Outstanding features of cvd chemical vapor deposition furnace :
1.Open tube furnace
2.To be input inert gas, hydrocarbon gas,hydrogen.
3.Max. Temperature 1200C

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!

Technical parameters of cvd chemical vapor deposition furnace :

Model	PT-1200 CVD grown graphene furnace
Control system	Intelligent temperature control system
Display mode	Digital tube display(LED)
Limiting temperature	1200℃
Working temperature	≤1150℃
Heating rate	≤20℃(suggestion:10℃/min)
Heating element	Aludirome
Heating zone	Single
Heating zone length	400mm
Furnace tube material	Quartz tube
furnace tube diameter	80mm
The furnace tube length	1000mm
Gas tightness	Vacuum flange and corundum furnace tube up to4.03×10-3Pa
Control mode	PID Temperature control
Temperature accuracy	±1℃
Thermal Couple	K Type
Working voltage	AC 110-480V 50Hz～60Hz
Rated power	3KW
The flow meter	Float flowmeter
Pneumatic pressure	-0.1～0.15 MPa
Warranty	12 month (exclusive wearing part)